Precursor vapourisation systems

Precursor Verdampfer mehrere Prozessausgänge 2 RI Schema

SIGA vaporization systems are designed to precisely supply precursor vapors for CVD and PECVD deposition processes. Vaporization and dosing are achieved through a direct vaporization and dosing system. SIGA offers systems utilizing a wide range of technologies, with or without carrier gas; however, carrier-gas-free systems are one of our key strengths.