Precursor vapourisation systems
SIGA vaporization systems are designed to precisely supply precursor vapors for CVD and PECVD deposition processes. Vaporization and dosing are achieved through a direct vaporization and dosing system. SIGA offers systems utilizing a wide range of technologies, with or without carrier gas; however, carrier-gas-free systems are one of our key strengths.
Precursor Versorgungssysteme – Plattform G504
These supply systems serve to reliably supply liquid dosing systems or vaporizer systems with liquid chemicals such as silanes, chlorides, and metal alkyls—including SiCl4, TiCl4, SiHCl3, HMDSO, DEZ, or TMA.
Activated carbon filter (ACF) loading stations – G306 and G517 platforms
Conditioning system / loading station using butane or gasoline. Activated carbon filters used in motor vehicles with gasoline internal combustion engines are loaded and purged in accordance with US regulations (CARB and EPA) and EC standard 98/69/EC.
Gas dosing and gas mixing systems – reliable and safe
SIGA gas mixing systems enable the precise mixing of technical gases for industrial processes—offering flexible configuration, exact control, and reliable process operation.
Wir stellen individuelle Systeme zusammen basierend etablierten Komponenten und sorgen für das richtige Sicherheitskonzept.
Customised solutions, test benches and partnerships
Depending on customer requirements, we also develop and manufacture custom systems for gas supply, gas mixing, and vaporization processes.
Research systems
For and with national and international research institutions, we develop specialized systems that are already exploring the technologies of tomorrow.