Precursor vapourisation systems

SIGA vaporization systems are designed to precisely supply precursor vapors for CVD and PECVD deposition processes. Vaporization and dosing are achieved through a direct vaporization and dosing system. SIGA offers systems utilizing a wide range of technologies, with or without carrier gas; however, carrier-gas-free systems are one of our key strengths.

Precursor Versorgungssysteme – Plattform G504

These supply systems serve to reliably supply liquid dosing systems or vaporizer systems with liquid chemicals such as silanes, chlorides, and metal alkyls—including SiCl4, TiCl4, SiHCl3, HMDSO, DEZ, or TMA. 

Aktivkohlefilter Beladestationen – Plattform G306 und G517

Conditioning system / loading station using butane or gasoline. Activated carbon filters used in motor vehicles with gasoline internal combustion engines are loaded and purged in accordance with US regulations (CARB and EPA) and EC standard 98/69/EC.

Gasmischanlagen, Gasdosier- und Gasmischsysteme – zuverlässig und sicher

SIGA gas mixing systems enable the precise mixing of technical gases for industrial processes—offering flexible configuration, exact control, and reliable process operation.
Wir stellen individuelle Systeme zusammen basierend etablierten Komponenten und sorgen für das richtige Sicherheitskonzept.

Customised solutions, test benches and partnerships

Depending on customer requirements, we also develop and manufacture custom systems for gas supply, gas mixing, and vaporization processes.

Research systems

For and with national and international research institutions, we develop specialized systems that are already exploring the technologies of tomorrow.