Precursor Verdampfersysteme - SIGA Systeme für industrielle Gasanwendungen GmbH

Precursor Verdampfer mehrere Prozessausgänge 2 RI Schema

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Precursor evapourisation systems

SIGA’s precursor evaporation systems enable the precise, carrier-free dosing and evaporation of liquid chemicals for CVD, PECVD, ALD and other deposition processes – safely, efficiently and cost-effectively.

We respond to our customers’ requirements, develop solutions in line with their specifications and tailor our systems to their needs.

Direct evaporation without a carrier gas
Evaporation using a carrier gas
Mixture following vaporisation with any process gases
Mass-flow-controlled or ‘charge and release’ via a buffer vessel
Use of all standard technologies: direct evaporators, bubblers, DLI, C&R
Ideal when used in combination with our G504 precursor refill system
Implementation as permanently sealed systems using metal seals
Ultra-high-purity gas components in UHP standards

Inquire about your evaporator system

Plattform V107 / V108 Precursor Verdampfer für einen Precursor mit einem Prozessausgang

Unsere Precursor verdampfer nach dem „Baking“ Prinzip erlauben es trägergasfrei die richtige Precursormenge zu dosieren.

The V107/V108 base system comprises an evaporator with a rinse inlet and one process outlet. Various configuration options are available, such as dosing into a process gas stream and the mixing of different vapours and gases. Where required, features such as controlled inerting of the exhaust gas stream, pressure relief valves, gas sensors, ventilation systems, back-pressure regulators and other process-specific components can be added.

There are now more than a dozen versions of the system, which we would be happy to tailor further to your requirements.

Direct evaporation without a carrier gas
Mass flow-controlled (typically 50 g/h to 2000 g/h depending on the medium)
Evaporator vessel 5.2 l, capacity 3.5 l, -1 to +5 bar
Rinsing function with pressure-switch rinsing
Fully heated process
Permanently technically leak-proof
Routines for refilling, rinsing and commissioning
Automatic in-process refilling, ideal when used in combination with our G504 precursor refill system
Configurable interfaces for control (ADS, Profinet, EtherCAT, WEB-HMI, and many more)
Price on request
Typical lead time 8–16 weeks

The simplest V107/V108 precursor vapourisation systems allow the vapour to be metered using an MFC from a heated vessel. All pipework is located within a heated area to prevent condensation.

Technische Daten Precursor Verdampfer System V107/V108 mit einem Precurser

Precursor Verdampfer für einen Precursor und mehrere Prozessausgänge 107/108-200

The ability to supply multiple consumers from a single evaporator makes it possible to build complex systems in a more compact manner and to utilise a shared evaporator source with the same medium. Overall, this reduces complexity and, consequently, costs and maintenance requirements, whilst increasing robustness.

Direkte Precursor Verdampfen ohne Trägergas
Mass flow-controlled: typically 50 g/h to 2000 g/h depending on the medium
up to 10 process outputs possible
Evaporator vessel 17 l, capacity 10 l, -1 to +5 bar
Evaporator temperature up to 45 °C (temperatures up to 150 °C on request), monitored by a safety temperature limiter
Applications e.g. HDMSO, HDMSN, TDMSO, TMA, DEZ, and many more
Heated zone up to 50 °C (higher temperatures up to 140 °C on request)
Supply to multiple consumers from a single evaporator
Permanently technically leak-proof and ultra-high purity thanks to UHP components
CPU-controlled with HMI and remote controllability via ADS, EtherCAT, Profinet by arrangement, Web HMI
Automatic in-process refilling, ideal when used in combination with our G504 precursor refill system
Price on request, depending on configuration
Delivery time from 12–16 weeks

Evaporator system, V107 variant, with 3 independent process outputs for metal alkyl evaporators.

Technical specifications of the evaporation system for one precursor and multiple process outlets

Plattform V111 Precursor Verdampfer für zwei oder mehr zur Mischung mit Prozessgasen

If a separation process involves the separation of several components that are present as liquids and are mixed with process gases or metered alternately, this platform allows for the full range of combinations, whilst also enabling multiple process outputs to be managed. The example shows a system with 2 evaporators and 6 process outputs, each of which meters independently. The platform has been built on numerous occasions and can be further adapted.

The system can also be adapted to different process gases through the use of multi-range and multi-gas MFCs.

By combining multiple components within a single system, it is possible to achieve a simply coordinated control system and to build a more compact system, which, taken together, reduces costs, maintenance requirements and integration efforts.

Internal connections improve reliability. MFC lines can be configured with redundancy to facilitate maintenance during continuous operation.

Direct evaporation without a carrier gas
Mass flow-controlled: typically 50 g/h to 2000 g/h depending on the medium
Evaporator vessel 10 l, capacity 7 l, -1 to +5 bar
Mixture of several process gases
Heated fluidic chamber prevents condensation
Permanently technically leak-proof
Combination of multiple evaporators, multiple process gases and multiple process outlets
Automatic in-process refilling, ideal when used in combination with our G504 precursor refill system
Price on request

Technical specifications for the V111 system for two or more precursors

Evaporator system for
Charge & Release from buffer tanks

As an alternative to dosing via an MFC, defined quantities of vapour can also be dispensed quickly using the ‘charge and release’ method from buffer vessels. This is particularly useful when defined quantities need to be dispensed within a short time. The ‘charge and release’ method is a viable solution for both small quantities dispensed quickly (e.g. ALD) and large quantities dispensed quickly.

A set pressure is built up in the buffer vessel from the evaporator. Valves close off the path to the evaporator. As required, other valves open the path to the process chamber. The vapour then flows from the buffer vessel into the chamber. The volume of the buffer vessel and the change in pressure during discharge allow the precursor vapour to be metered in a reproducible manner. The pressure build-up in the buffer vessel can be controlled, and processes can be further varied by diluting the vapour with a carrier gas.

This offers a wide range of control options for achieving precise and stable dosing processes. As the process operates entirely without MFCs, this system can also handle temperatures in excess of 200°C.

Direct evaporation without a carrier gas
Volume-controlled via buffer volume, filling pressure and discharge pressure (time)
Process gases can be mixed in the buffer vessel
No MFC required
Temperatures above 200°C possible
Evaporator vessels from 0.5 l to 30 l
Buffer vessels from < 0.1 l up to 30 l (larger sizes available on request)
Multiple evaporators per system and/or multiple buffer vessels connected to a single evaporator possible
Automatic in-process refilling, ideal when used in combination with our G504 precursor refill system
Permanently technically leak-proof
Prices on request, depending on configuration
Delivery within 8 to 16 weeks, depending on the configuration level

SIGA GmbH’s Charge & Release systems enable the controlled delivery of steam volumes and steam pulses without the need for an MFC.

Technical specifications for Charge & Release systems

Bubbler Precursor Verdampfer

Bubbler Precursor Verdampfer nutzen ein Trägergas, welches durch den beheizten Verdampfertank geführt wird und zusammen mit dem Precursordampf den Bubbler wieder verlässt.
Sie sind besonders für Prozesse geeignet in denen durch den Precursordampf alleine kein ausreichender Prozessdruck aufgebaut werden kann.

At the inlet to the evaporator, the flow of the carrier gas is monitored, whilst the pressure is measured at the outlet and the temperature is measured inside the evaporator. As a cost-effective alternative to carrier-gas-free evaporators, bubbler evaporator systems require a small degree of contamination of the precursor by the carrier gas to be accepted. An additional concentration sensor at the outlet helps to monitor the extent of this contamination. Furthermore, the precursor contains residues of the carrier gas, as it is continuously flowed through with the carrier gas.

Although now considered an outdated evaporation system, a bubbler, by virtue of its design, offers a very cost-effective overall system for atmospheric processes with a limited degree of accuracy.

Um geringere Beladeraten zu erreichen und unterhalb der
Raumtemperatur zu verdampfen, kann ein sekundärer Wärmetauscher mit Kühler
eingesetzt werden.

Our basic system consists of a bubbler with a Coriolis liquid MFC on the inlet side and a pressure regulator on the outlet side.

We would be happy to configure your system to meet your specific requirements.

Evaporation using a carrier gas
Indirect mass-flow-controlled
Pressure amplification via carrier gas for atmospheric processes and low evaporation temperatures
Simple design
Heating and cooling possible
Permanently technically leak-proof
Available in standard pack sizes such as DOCK 10, 20, 50 or 100
Automatic in-process refilling, ideal when used in combination with our G504 precursor refill system
Manufactured from S316L / 1.4404, suitable for all common precursors with dry carrier gases
Price on request, depending on configuration
Typical lead time: 8 to 16 weeks after order confirmation

Bubbler Precursor Verdampfersysteme der SIGA GmbH

Technical specifications for bubbler evapourisation system for one or more precursors

Liquid dosing followed by evaporation
(direct evaporation)

Die Dosierung mit einem Trägergas ist die genauere Alternative für die Nutzung sogenannter DLI (Direct Liquid Injection) Systeme oder auch CEM (Controlled Evaporation and Mixing) Systeme.
Hierbei wird sowohl der Massenstrom des Trägergases als auch der Massenstrom des Precursors kontrolliert. Anschließend werden beide Medien zusammengeführt. Die Flüssigkeit wird verdampft und gemeinsam mit dem Trägergas transportiert. Es existieren verschiedene Systeme die teils den erhitzen Trägergasstrom selbst zur Weiterverdampfung eines gebildeten Aerosols nutzen.

Thanks to precise fluid metering, DLI systems ensure the highest levels of accuracy in both the quantity and composition of the process gases supplied.

SIGA GmbH uses only components from reputable manufacturers in its systems, as required. Thanks to our expertise, we can also combine different precursors and processes within a single system, in accordance with customer requirements.

Example: 4-line mixing system

– Silane from a gas cabinet
– HMDSO from a DLI system without carrier gas
– TTIP from a DLI system with carrier gas
– TMA from a direct evaporator (baking)

Use of established DLI (Direct Liquid Injection) systems from established manufacturers
For liquids that are difficult to vaporise or at low temperatures
Experimental and production systems
With (e.g. TTIP) and without a carrier gas (e.g. water)
Permanently technically leak-proof
Typical lead time: 12 to 20 weeks after order confirmation
Price on request, depending on configuration

An evaporator and gas mixing system that combines both direct evaporators and two DLI systems

Technical specifications for liquid dosing followed by evaporation

Customised evaporator systems

In line with your requirements, we will build your bespoke evaporator solution using our modular system. We are experienced in, and look forward to, integrating new components and solutions to provide you with an optimal and efficient solution. We are also happy to produce these in series.

Application-oriented and tailor-made
Gain a competitive edge with the ideal system for your process
Rapid implementation thanks to a proven modular system
Hardware, software and security from a single source
Proven components based on 30 years’ experience
Integration of new components from the market using an established supplier network
Any combination of different evaporation strategies
We would be happy to provide you with a quotation

Your process, your system!

Precursor Verdampfer

Precursor Verdampfer dienen der Verdampfung und Dosierung flüssiger Precursor die einem CVD, PECVD oder ALD Abscheideprozess als Gasphase zugeführt werden. Die Precursor Verdampfung und Dosierung erfolgt entweder über ein System ohne Trägergas, dem Direktverdampfer oder unter Verwendung eines Trägergases.

Typische Anwendungen sind die Verdampfung und Dosierung von Wasser, Lösungsmitteln, Silanen, Chloriden und Metallalkylen wie SiCl4, TiCl4, SiHCl3, HMDSO, DEZ, TMA oder TEOS. Selbstverständlich können auch alle anderen Precursor eingesetzt werden. Gerne prüfen wir auch besondere Precursor und Arbeitsbereiche auf Machbarkeit. Die Verdampfersysteme werden häufig in CVD, PECVD oder ALD Prozessen zur Abscheidung aus der Gasphase, in der Regel bei reduzierten Prozessdrücken (LPCVD) oder mit Plasmaunterstützung (PECVD) eingesetzt. Anwendungen ergeben sich auch bei atmosphärischen Prozessdrücken, wie bei der Flammenhydrolyse, FHD oder Plasmasprühprozessen.

Zu den besonderen Merkmalen unserer Verdampfersysteme gehört, neben der Möglichkeit der Verdampfung ohne Trägergas, die Möglichkeit aus einem Verdampfer mehrere Verbraucher zu versorgen. Es können sowohl mehrere Prozesskammern gleichzeitig versorgt werden als auch an verschiedenen Punkten der Prozesskammer Precursor-Dampf eingespeist werden.

The ability to supply multiple consumers from a single evaporator reduces the number of components, control elements and the space required for installation compared with other designs. Overall, this helps to reduce the costs of maintenance, plant engineering and system integration. Another option is to integrate two evaporators into a single system with a shared control system.

Precursor Verdampfer – Direct evaporation systems (baking)

The precursor is fed into a stainless steel tank, the evaporator, where it is regulated to the desired evaporation temperature. The resulting vapour phase is regulated to the set flow rate via a mass flow controller (MFC) and fed into the process. Additional gas streams can be adjusted and fed into the process, irrespective of the required amount of precursor.

Precursor Verdampfer – Bubbler Verdampfersysteme

Bubblersysteme dagegen arbeiten mit einem Trägergasstrom zum Austragen des Precursors indem das Trägergas durch ein Vorlagegefäß geführt wird. Diese Systeme sind einfach aufgebaut und ermöglichen in Kombination mit Standardbehältern (z.B. von Dockweiler chemicals) eine kostengünstige reproduzierbare Lösung innerhalb eines, für viele Prozesse ausreichenden, Genauigkeitsbereichs. Durch den Einsatz von zusätzlichen Sensoren kann der Genauigkeitsbereich verbessert werden. Beispielsweise kann ein Feuchtesensor zusammen mit einem Wasserverdampfer eingesetzt werden, um die Feuchtigkeit nach dem Bubbler zu messen. Durch die Zumischung von trockenem Stickstoff lässt sich der benötigte Feuchtigkeitswert erreichen (siehe Befeuchtung AKF Stationen).

Processes in which accuracy is of the utmost importance should, however, favour direct evaporator systems.

Precursor Verdampfer – DLI systems (Direct Liquid Injection)

DLI systems represent another variant. Here, the precursor is evaporated in a metered manner using a liquid flow controller and then mixed with the carrier gas. To enable evaporation at the level of the carrier gas pressure, the gas flow itself is utilised for aerosol formation and evaporation. Process temperatures range from room temperature to well over several hundred degrees Celsius. Owing to the independent flow control of the precursor and carrier gas, these systems achieve a high degree of accuracy in absolute dosing, similar to direct evaporators, but can reach higher maximum pressures.

Such equipment is available on the market from various manufacturers, and we at SIGA GmbH integrate it into our systems as required. However, this complex equipment makes the systems more expensive and must be operated using high-quality media, as replacing the components is considerably more costly than replacing a simple MFC.

Precursor Verdampfer – Charge & Release systems

Charge & Release systems dispense without the use of MFCs, based on pressure and volume in a buffer vessel. The buffer vessel is filled with vapour from the evaporator up to a maximum of the current evaporator pressure and then emptied into the process. The dispensed volume can be controlled via pressure differential, temperature and volume. These systems do not require MFCs and allow for the dispensing of small vapour volumes, as required in ALD processes, as well as the short-term delivery of high flow rates. By adjusting the pressure and temperature, as well as using buffer vessels and outlet orifices, reproducible processes can be set up across a wide range of parameters. Furthermore, the systems operate without being limited, for example, by the temperature resistance of MFCs.

Precursor Verdampfer – SIGA GmbH

Die Siga GmbH ist in der Lage alle Arten von Verdampfersysteme aufzubauen und zu applizieren. Ausserdem bauen wir auch Kombinationen der verschiedenen Prinzipien auf wo angebracht um das optimale System zu erreichen oder diesem möglichst nahe zu kommen. So wurden schon Systeme gebaut in denen Direktverdampfer, Baking Verdampfer und Bubbler zugleich im Einsatz sind.

Our evaporator systems feature metal seals; elastomers are not used within the evaporator system. This fulfils a key requirement for safe operation. The system is designed on a bespoke basis according to the specific requirements of each application. The operating temperature of the evaporator is determined by the process pressure and the vapour pressure of the selected precursor and can, for example, range up to 80°C or up to 140°C.

Pressure and temperature within the evaporator are monitored; in the event of overpressure or overtemperature, the evaporator’s heating is switched off. All components carrying precursor vapour are heated. The system is housed in its own enclosure. Pipe trace heating for the vapour line to the process chamber is also fitted if the line pressure so requires.

The pipework and all components in contact with precursor vapour are made of stainless steel, material no. 1.4404, equivalent to SS316L. Face-seal fittings are used, e.g. Swagelok VCR. The utmost importance is attached to ensuring a leak-tight design. Fixed pipe joints are welded using orbital welding under an inert gas atmosphere.

The evaporator can be automatically refilled whilst the process is running. A precursor refill system is used to refill the evaporator. The precursor is stored in a storage vessel and, with the aid of a gas reservoir, is forced out through an immersion tube and fed into the evaporator.

The evaporator is controlled and monitored – including temperature control and automatic refilling – by the evaporator control system via a programmable logic controller (PLC) with a touch-screen for visualisation and operation. All functions are regulated by this control system. The setpoint for the MFCs and the selection of the desired gas path are determined by the higher-level control system of the coating plant. Communication is via a Profibus DP or another serial interface. The details of the control system, such as the type of operation with options for manual intervention and communication with the higher-level control system, are adapted to the requirements of the process.

The evaporator systems are installed in suitable sheet steel enclosures or in standard control cabinets. The control unit and evaporator can be integrated into a single cabinet or installed in two separate cabinets. The configuration can be adapted so that the system can be integrated into the coating plant as effectively as possible and tailored to the requirements at the installation site.

The integrated PLC control system with touch screen enables automatic regulation of temperature, pressure and level. Continuous replenishment whilst the process is running can be achieved via an external supply system with a gas reservoir – reliably and user-friendly. Communication with the main plant takes place via Profinet, Ethernet with SecureADS, RS485 or other industry standards.

Neben passiven Sicherheitselementen und geschlossenen Sicherheitsbauteilen wie Sicherheitstemperaturschaltern oder Sicherheitsschwellwertschaltern kommt wenn nötig auch eine Sicherheits SPS (z.B. TwinSAFE) zum Einsatz durch welche die sicherheitskritischen Funktionen geschleust werden und welche diese unabhängig vom eigentlichen Steuerprogramm basierend auf einer Logiktabelle welche aus einer Sicherheitsbetrachtung stammt unterbrechen oder aktivieren kann.

Safety functions such as shutdown in the event of overpressure or overtemperature are an integral part of the control system. The system can be configured modularly: as a stand-alone solution or as a multi-precursor system with central control. Enclosures made of sheet steel or in explosion-proof designs are available, as is integration into existing control cabinets.

Metallic seals and leak-proof: No elastomers in the steam path; orbitally welded stainless steel components (SS316L).
Heated vapour path: All pipes carrying precursor vapour, including pipe trace heating up to the process chamber, are heated – no risk of condensation.
Reduced installation effort: Supplying multiple process points from a single evaporator saves on components, valves, control systems and space.