Logo of SIGA GmbH

Liquid flow control with subsequent vaporisation

System for the supply of 2 precursors for a liquid flow control with subsequent flash vaporization.
Gallery Liquid flow control with subsequent vaporisation (click to open)
System for liquid flow control of HMDSO with subsequent flash vaporization – without carrier gas. System for liquid flow control of TTIP with subsequent flash vaporization – with carrier gas.

An alternative to first vaporizing the precursor and then controlling the flow of vapour is to first control the flow of the liquid precursor and then to vaporize the liquid. Usually this vaporization has to be assisted by the flow of a carrier gas.